EUV’s Most Difficult Challenge

EUV’s Most Difficult Challenge

#EUVs #Difficult #Challenge

“Asianometry”

ASML and its partners had to overcome many challenges in order to make EUV lithography a reality.

For instance, in a previous video I talked about the EUV light source and its double-shot technique. But while challenging, that had not been considered one of EUV’s dealbreaking issues.

A…

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